close

Вход

Забыли?

вход по аккаунту

?

JP2003023698

код для вставкиСкачать
Patent Translate
Powered by EPO and Google
Notice
This translation is machine-generated. It cannot be guaranteed that it is intelligible, accurate,
complete, reliable or fit for specific purposes. Critical decisions, such as commercially relevant or
financial decisions, should not be based on machine-translation output.
DESCRIPTION JP2003023698
[0001]
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a
diaphragm for an electrostatic electroacoustic transducer, and more particularly to an
electrostatic electricity formed by forming a titanium thin film and a nickel thin film on the
surface of an ultrathin film made of synthetic resin. The present invention relates to a diaphragm
for an acoustic transducer.
[0002]
2. Description of the Related Art The vibrating film of an electroacoustic transducer is
conventionally applied a resistance heating vapor deposition technique to the surface of an
ultrathin film made of a synthetic resin such as polyphenyl sulfide (PPS) or polyethylene
terephthalate (PET). It was configured by depositing a nickel thin film. However, the film
formation of the nickel thin film on the surface of the ultrathin film by the resistance heating
vapor deposition technique is scarce in mass productivity, and it can not be said that the
manufacturing cost of the constituted vibrating film is low. And, the nickel thin film formed on
the surface of the ultrathin film tends to have unevenness in the film thickness, and the
fluctuation of the resonance frequency was remarkable as the vibrating film. In addition, since
the nickel thin film has poor weather resistance, and in particular, exhibits the phenomenon of
heat loss that is deteriorated by radiant heat, it was inappropriate to use this vibrating membrane
as a vibrating membrane of an electroacoustic transducer exposed to high temperatures. .
11-05-2019
1
[0003]
An ultra-thin film formed by employing aluminum instead of nickel as a metal material to be
deposited as an electrode thin film on the surface of an ultra-thin film is also used as a vibrating
membrane of an electroacoustic transducer There is. Here, since there is a possibility that the
aluminum thin film formed on the ultrathin film may peel off, an acrylic resin protective thin film
is formed on the surface of the aluminum thin film to cope with the peeling. However, the
method of manufacturing a vibrating film that forms an aluminum thin film on an extremely thin
film and protects it by forming an acrylic resin protective thin film is poor in mass productivity,
and the formed aluminum thin film and acrylic resin protective thin film It is difficult to form a
film uniformly in thickness, and the variation in film thickness can not be eliminated.
[0004]
SUMMARY OF THE INVENTION In the present invention, the surface of an ultrathin film is used
instead of employing aluminum as a metal material to be deposited as an electrode thin film on
the surface of an ultrathin film made of synthetic resin. The titanium thin film and the nickel thin
film are formed by sputtering film forming method to solve the above problems, there is little
variation in frequency characteristics over wide band, super light weight, good sensitivity, high
mechanical strength, good weather resistance It is an object of the present invention to provide a
diaphragm for an electrostatic electroacoustic transducer.
[0005]
A titanium thin film is formed by sputtering on the surface of a very thin film made of synthetic
resin, and a nickel thin film is formed on the surface of this titanium thin film by sputtering.
Alternatively, a nickel thin film was formed by sputtering, and a titanium thin film was formed on
the surface of the nickel thin film by sputtering to form a diaphragm for an electrostatic
electroacoustic transducer.
In a second aspect of the present invention, in the diaphragm for an electrostatic electroacoustic
transducer according to the first aspect, the ultrathin film is made of a film of polyphenyl sulfide
or polyethylene terephthalate having a thickness of about 2 μm. A vibrating membrane was
constructed.
[0006]
11-05-2019
2
According to a third aspect of the present invention, in the diaphragm for an electroacoustic
transducer according to any one of the first and second aspects, the thickness of the nickel thin
film or the titanium thin film is 50 ° or more. A diaphragm for acoustic transducer was
constructed. In a fourth aspect of the present invention, in the diaphragm for an electroacoustic
transducer according to any one of the first to third aspects, the titanium thin film is formed to
be a titanium rich with a large thickness and the nickel thin film is a thickness of the titanium
thin film. A vibrating film for an electrostatic electroacoustic transducer was formed, which was a
thin film having a smaller thickness than the thin film.
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will
be described with reference to the examples shown in FIGS. 1 and 2. FIG. 1 is a perspective view
of the entire sputtering deposition apparatus, and FIG. 2 is a view for explaining the inside of a
vacuum chamber for carrying out the sputtering deposition. Reference numeral 1 denotes a
vacuum chamber of the sputtering deposition apparatus, and 100 denotes a film supply and
removal apparatus. The vacuum chamber 1 is installed and fixed to a base 200. A first cathode 6
is attached to the vacuum chamber 1. A Ti target 61 is attached and fixed to the first cathode 6. A
second cathode 7, which is another cathode, is attached to a symmetrical position with respect to
the central axis of the vacuum chamber 1. A Ni target 71 is attached and fixed to the second
cathode 7. The film feeding and removing apparatus 100 is attached and fixed to the carriage
101, and is configured to travel on a traveling rail 110 laid on the base 200. The traveling rail
110 is extended until the vacuum tank 1 is installed and fixed, and the carriage 101 is caused to
travel relative to the vacuum tank 1 to insert the film supply and removal apparatus 100 into the
vacuum tank 1 as shown in FIG. In the state, or the film feeding and removing apparatus 100 can
be pulled out from the vacuum chamber 1 to be in the state shown in FIG. The carriage 101 is
controlled via the traveling operation panel 102.
[0008]
Here, particularly, referring to FIG. 2, this shows a cross section in a state where the carriage 101
is moved relative to the vacuum chamber 1 and the film feeding and removing apparatus 100 is
inserted into the vacuum chamber 1. 2 is a roll-like ultra-thin film made of a synthetic resin to be
described after being wound on the feed roll 21. Reference numeral 22 denotes a first supply
pulley for guiding the ultrathin film 2, and reference numeral 23 denotes a second supply pulley
11-05-2019
3
for guiding the ultrathin film 2. The bombardment processing device 8 is positioned and fixed
between the first supply pulley 22 and the second supply pulley 23. The bombarding apparatus
8 is a plasma generating apparatus, and is disposed downstream of the supply roll 21 to clean
the surface of the ultra-thin film 2 coming in contact with plasma for cleaning. 24 is a third
supply pulley to which is attached a pinch roll indicated by 241. 5 is a cooling roll positioned in
the film deposition unit, 25 is a first winding pulley, 26 is a second winding pulley, 27 is a third
winding pulley, and 28 is a winding roll.
[0009]
The first cathode 6 of the sputtering deposition apparatus is attached to the vacuum chamber 1
as described above, and is inserted into and accommodated in the vacuum chamber 1 and is
drawn out from the vacuum chamber 1. When the first cathode 6 is inserted into the vacuum
chamber 1, the first target 6 is positioned so as to face the circumferential surface of the cooling
roll 5. The second cathode 7 of the sputtering deposition apparatus is also inserted into and
accommodated in the vacuum chamber 1 and is drawn out of the vacuum chamber 1. When the
second cathode 7 is inserted into the vacuum chamber 1, the Ni target 71 is positioned to face
the circumferential surface of the cooling roll 5 downstream of the ultrathin film 2 supplied from
the first cathode 6. Be done. The target 61 of the first cathode 6 can be replaced with nickel, and
the target 71 of the second cathode 7 can be replaced with titanium.
[0010]
Next, how to form the electrode thin film on the ultrathin film 2 will be described. Prior to
inserting and storing the film supply and removal apparatus 100 in the vacuum chamber 1, the
ultrathin film 2 is wound around the supply roll 21 to form a coiled film, and the coiled film is
pulled out to sequentially form the first film. The supply pulley 22, the bombardment processing
device 8, the second supply pulley 23, the third supply pulley 24, the cooling roll 5, the first
take-up pulley 25, the second take-up pulley 26, and the third take-up pulley 27 to set in the
scooping roll 28. As the ultrathin film 2, an ultrathin film of polyphenyl sulfide or polyethylene
terephthalate having a thickness of about 2 μm is used. The ultra-thin film 2 is cut to a width of
500 mm and a length of about 10000 mm and wound on a supply roll 21. After the ultra-thin
film 2 is wound and set on the supply roll 21, the carriage 101 is caused to travel relative to the
vacuum chamber 1 to insert and store the film supply and removal apparatus 100 having the
ultra-thin film 2 set therein. . Then, the Ti target 61 is attached and fixed to the first cathode 6
and the Ni target 71 is attached and fixed to the second cathode 7, and the first cathode 6 and
the second cathode 7 are described above in the vacuum chamber 1 Position in position.
11-05-2019
4
[0011]
Here, after vacuum chamber 1 is evacuated by a vacuum pump, argon Ar and other sputtering
gases are introduced at a pressure of about 101 to 10 −1 Pa, and Ti target 61 and Ni target 71
and cooling roll 5 When DC power is applied with a negative potential at the target in the
meantime, glow discharge is generated between the two to generate Ar plasma. The positive ion
Ar + of Ar in this plasma is accelerated at the cathode potential drop in the vicinity of the target
and collides with the surface of the Ti target 61 and the surface of the Ni target 71, and the
constituent material is sputtered. The particles of the target constituent material sputtered from
the Ti target 61 and the Ni target 71 adhere to the target facing area of the surface of the
ultrathin film 2 supplied to the circumferential surface of the cooling roll 5, and the thin film of
the target constituent material is here It will be formed. In order to explain step by step, the ultrathin film 2 reaches the bombard processing device 8 in the process of being drawn out gradually
from the supply roll 21 and being cooled by the take-up roll 28 while being cooled by the cooling
drum 2. Is treated with bombardment. Next, the ultra-thin film 2 was unrolled, and the
bombarded surface was facing the Ti target 61 of the first cathode 6 along the surface of the
cooling roll 5 and was bombarded. The particles of the target constituent material sputtered from
the Ti target 61 adhere to the surface to form a titanium thin film. The ultra thin film 2 is further
rolled, and the surface on which the titanium thin film is formed is formed to face the Ni target
71 of the second cathode 7 in a state along the surface of the cooling roll 5. Particles of the
target constituent material sputtered from the Ni target 71 adhere to the surface of the formed
titanium thin film, and a nickel thin film is formed. In the film forming process of the electrode
thin film, the temperature of the cooling drum 2 and the operating conditions of the first cathode
6 and the second cathode 7 are appropriately set, and the thickness of the titanium thin film and
the nickel thin film and other design conditions are specified. . The thickness of the nickel thin
film or titanium thin film is preferably 50 Å (Angstroms) or more. And, in particular, when the
titanium thin film is formed to be titanium rich with a large thickness and to be a nickel thin film
smaller than the thickness of the titanium thin film, the diaphragm for the electroacoustic
transducer configured is sufficiently lightened while being greatly reduced In addition, since the
vibration film is lightweight, vibration becomes easy, and the sensitivity of the electroacoustic
transducer incorporating the vibration film is improved.
[0012]
The ultra-thin film 2 wound on the supply roll 21 is continuous from the supply roll 21 to the
take-up roll 28, and finally it is taken off by the take-up roll 28. The ultra-thin film 2 is wound
11-05-2019
5
from the supply roll 21 to the separation roll 28 while the supply speed is adjusted by the pinch
roll 241, but the first supply pulley 22, the second supply pulley 23, The film is supplied via the
third supply pulley 24 to the peripheral surface of the cooling roll 5 positioned in the film
deposition section. This ultra-thin film 2 is further removed from the peripheral surface of the
cooling roll 5 to the removal roll 28 via the first removal pulley 25, the second removal pulley
26, and the third removal pulley 27. .
[0013]
As described above, the ultra-thin film 2 wound on the supply roll 21 is continuously wound
from the supply roll 21 to the take-up roll 28 while the supply speed is controlled and controlled
by the pinch roll 241. While being swept away, it reaches the bombardment processing unit 8
and the bombardment treatment is applied to the surface, and then the surface which is further
swept away and the bombarded treatment is applied to the Ti target 61 of the first cathode 6 The
titanium thin film is deposited on the bombarded surface to reach the opposite position. The
ultra thin film 2 is further scooped off, and the surface on which the titanium thin film is
deposited is deposited so that the surface of the second cathode 7 faces the Ni target 71 and the
nickel thin film is deposited on the titanium thin film surface. The film is deposited. After all, a
titanium thin film and a nickel thin film are sequentially deposited on the surface of the ultrathin
film 2.
[0014]
As described above, according to the present invention, an ultra-lightweight, good sensitivity, a
large mechanical strength, and a good weatherability electricity with little variation in frequency
characteristics over a wide band. An acoustic transducer diaphragm can be configured. That is,
the diaphragm for electrostatic type electroacoustic transducer according to the present
invention is formed by depositing a titanium thin film by sputtering on the surface of an ultrathin
film made of synthetic resin and depositing a nickel thin film onto the surface of this titanium
thin film by sputtering. Alternatively, a nickel thin film is formed by sputtering, and a titanium
thin film is formed on the surface of the nickel thin film by sputtering. According to this
configuration, it is possible to configure a diaphragm for an electroacoustic transducer that can
ensure sufficient electrical continuity while being lightweight. This vibrating membrane is stable
without deterioration over a long period of time because it is composed of a nickel thin film and a
titanium thin film, both of which are highly corrosion resistant metals, and since it is lightweight,
vibration becomes easy, and this vibration is The sensitivity of the electroacoustic transducer
incorporating the membrane is improved.
11-05-2019
6
[0015]
Here, when a titanium thin film is formed by sputtering on the surface of an ultrathin film made
of a synthetic resin and a nickel thin film is formed on the surface of this titanium thin film by
sputtering, titanium has a specific resistance of 0.70 × 10-4 cm, specific gravity: 4. On the other
hand, nickel has a specific resistance of 6. 9 × 10 -6 cm, a specific gravity of 8. Since it is 84, the
diaphragm for the electroacoustic transducer is greatly reduced in weight by forming the
titanium thin film to be a titanium rich with a large thickness and using a nickel thin film having
a small thickness as compared to the thickness of the titanium thin film. However, sufficient
electrical continuity can be ensured. Moreover, the vibration film is easy to vibrate because it is
lightweight, and the sensitivity of the electroacoustic transducer incorporating the vibration film
is improved.
[0016]
A vibrating film formed by depositing a nickel thin film by sputtering and depositing a titanium
thin film by sputtering on the surface of the nickel thin film also achieves the same function and
effect as described above. In addition, since the titanium thin film constitutes the surface layer, it
is possible to obtain a diaphragm for an electroacoustic transducer with further improved
corrosion resistance.
[0017]
Brief description of the drawings
[0018]
1 is a perspective view for explaining the embodiment.
[0019]
2 is a cross-sectional view of the embodiment of FIG.
11-05-2019
7
Документ
Категория
Без категории
Просмотров
0
Размер файла
17 Кб
Теги
jp2003023698
1/--страниц
Пожаловаться на содержимое документа