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JPH11355894

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This translation is machine-generated. It cannot be guaranteed that it is intelligible, accurate,
complete, reliable or fit for specific purposes. Critical decisions, such as commercially relevant or
financial decisions, should not be based on machine-translation output.
DESCRIPTION JPH11355894
[0001]
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a
diaphragm for an electroacoustic transducer, and a method and apparatus for manufacturing the
same, and in particular, an aluminum thin film covered with a protective weight and having high
mechanical strength and good weather resistance. The present invention relates to a diaphragm
for an electroacoustic transducer that can be easily and inexpensively deposited on a film at
once, a method of manufacturing the same, and an apparatus for the same.
[0002]
2. Description of the Related Art The vibrating film of an electroacoustic transducer is
conventionally a nickel thin film by applying a resistance heating deposition technique to the
surface of an ultrathin film made of a synthetic resin such as polyphenyl sulfide (PPS) or
polyethylene terephthalate (PET). Was formed by film formation. However, the formation of a
nickel thin film on the surface of an ultrathin film by resistance heating deposition technology is
poor in mass productivity, and it can not be said that the manufacturing cost of the constituted
vibrating film is low. And, since the nickel thin film formed on the surface of the ultrathin film
has low weather resistance and is particularly deteriorated by radiant heat, it is unsuitable for
use as a vibrating membrane of an electroacoustic transducer exposed to high temperature .
[0003]
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Then, an ultrathin film obtained by adopting aluminum instead of nickel as a metal material to be
deposited as an electrode thin film on the surface of the ultrathin film is also used as a vibrating
membrane of the electroacoustic transducer. Here, since there is a possibility that the aluminum
thin film formed on the ultrathin film may peel off, an acrylic resin protective thin film is formed
on the aluminum thin film surface to cope with the peeling. However, the method of
manufacturing a vibrating film that forms an aluminum thin film on an extremely thin film and
protects it by forming an acrylic resin protective thin film is poor in mass productivity, and the
formed aluminum thin film and acrylic resin protective thin film It is difficult to form a film
uniformly in thickness, and the variation in film thickness can not be eliminated.
[0004]
SUMMARY OF THE INVENTION According to the present invention, an aluminum thin film with a
light weight, high mechanical strength and good weather resistance which has been coated and
protected which solves the above-mentioned problems is extremely easy at once to an ultrathin
film made of synthetic resin. It is an object of the present invention to provide a diaphragm for
an electroacoustic transducer which can be deposited at low cost, and a manufacturing method
and apparatus thereof.
[0005]
According to the present invention, an aluminum thin film is deposited on the surface of an
ultrathin film 2 made of a synthetic resin, and a nickel thin film or titanium thin film is deposited
on the surface of the aluminum thin film. A coated diaphragm for an electroacoustic transducer
was constructed.
In a second aspect of the present invention, in the diaphragm for an electroacoustic transducer
according to the first aspect, the ultrathin film 2 is a diaphragm for an electroacoustic transducer
comprising an ultrathin film of polyphenyl sulfide or polyethylene terephthalate having a
thickness of about 2 μm. Configured.
[0006]
In a third aspect of the present invention, in the diaphragm for an electroacoustic transducer
according to the second aspect, the thickness of the aluminum thin film or the titanium thin film
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2
is 100 Å or more. Here, Claim 4: The ultra-thin film 2 made of a synthetic resin wound around
the feed roll 21 is guided by the feed pulley including the feed pulley 24 provided with the pinch
roll 241, the cooling roll 5, and the winding pulley Production of diaphragm for electro-acoustic
transducer in which aluminum thin film is deposited sequentially on the surface of ultra-thin film
2 in the middle part to be swept by stripping roll 28 and then nickel thin film or titanium thin
film is deposited on aluminum thin film surface I configured the method.
[0007]
In a fifth aspect of the present invention, in the method of manufacturing a diaphragm for an
electroacoustic transducer according to the fourth aspect, the ultra-thin film 2 is cut to a width of
500 mm and a length of about 1000 mm and wound on a supply roll 21. A method of
manufacturing a diaphragm for an electroacoustic transducer was constructed. In a sixth aspect
of the present invention, in the method of manufacturing a diaphragm for an electroacoustic
transducer according to any of the fourth and fifth aspects, the DC sputtering power is 200 to
1000 W, and the introduced gas is argon. The feed rate of 0. 38∼0. A method of
manufacturing a diaphragm for an electroacoustic transducer at 48 meters / minute was
constructed.
[0008]
Furthermore, the vacuum tank 1 of the sputter deposition apparatus is provided, the film supply
and removal apparatus 100 is provided, and the base 200 on which the vacuum tank 1 is
installed and fixed is provided. 1 and the second cathode 7 attached at symmetrical positions
with respect to the central axis of the vacuum chamber 1, the film feeding and removing
apparatus 100 is mounted and fixed, and the carriage 101 is provided. The traveling rail 110
installed on the platform 200 is extended until the vacuum tank 1 is installed and fixed, and the
carriage 101 is caused to travel relative to the vacuum tank 1 for film feeding and removal. 100
is inserted into the vacuum chamber 1, or the film supply and removal device 100 is pulled out
from the vacuum chamber 1, and the film supply and removal device 100 is made of a synthetic
resin and is extremely thin. The feed roll 21 including the feed roll 21 around which the film 2 is
wound, the feed pulley 24 including the feed pulley 24 to which the pinch roll 241 for guiding
the ultrathin film 2 is attached, the cooling roll 5, the take-up pulley and the take-up roll 28 The
cathode 6 of 1 is attached and fixed with an Al target 61 and positioned so as to face the
circumferential surface of the cooling roll 5, and the second cathode 7 is attached and fixed with
a Ni target 71 from the first cathode 6 The apparatus for manufacturing a diaphragm for an
electroacoustic transducer, which is positioned to face the circumferential surface of the cooling
roll 5 downstream of the ultra-thin film 2, is configured.
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[0009]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A vibrating membrane used for a
micro-electroacoustic transducer such as an electret condenser microphone is constructed by
forming an extremely thin electrode thin film on one side or both sides of an ultrathin film made
of a synthetic resin. Be done.
Hereinafter, this will be described with reference to FIGS. 1 and 2.
[0010]
1 and 2 are diagrams for explaining an embodiment of the present invention. FIG. 1 is a
perspective view of the entire sputter deposition apparatus, and FIG. 2 is a view for explaining
the inside of a vacuum chamber for performing sputter deposition. Referring to FIG. 1, reference
numeral 1 denotes a vacuum chamber of a sputter deposition apparatus, and 100 denotes a film
feeding and removing apparatus. The vacuum chamber 1 is installed and fixed on a base
indicated by 200. The vacuum chamber 1 is provided with a first cathode 6 described later. A
second cathode 7, which is another cathode, is attached to a symmetrical position with respect to
the central axis of the vacuum chamber 1. The film feeding and removing apparatus 100 is
attached and fixed to the carriage 101, and is configured to travel on a traveling rail 110 laid on
the base 200. The traveling rail 110 is extended until the vacuum tank 1 is installed and fixed,
and the carriage 101 is caused to travel relative to the vacuum tank 1 to insert the film supply
and removal apparatus 100 into the vacuum tank 1 or the film supply The drawing device 100 is
pulled out of the vacuum chamber 1 to be in the state of FIG. The carriage 101 is controlled via
the traveling operation panel 102.
[0011]
A film feeding and removing apparatus 100 will be described with reference to FIG. This figure
shows a cross section in a state where the carriage 101 is caused to travel relative to the vacuum
chamber 1 and the film feeding and removing apparatus 100 is inserted into the vacuum
chamber 1. An ultra-thin film 2 made of a synthetic resin wound on a feed roll 21 is wound in a
coil. Reference numeral 22 denotes a first supply pulley for guiding the ultrathin film 2, and
reference numeral 23 denotes a second supply pulley for guiding the ultrathin film 2. 24 is a
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third supply pulley to which is attached a pinch roll indicated by 241. 5 is a cooling roll
positioned in the film deposition unit, 25 is a first winding pulley, 26 is a second winding pulley,
27 is a third winding pulley, and 28 is a winding roll.
[0012]
The first cathode 6 of the sputter deposition apparatus is attached to the vacuum chamber 1 as
described above, and is inserted and contained in the vacuum chamber 1 and is drawn out from
the vacuum chamber 1. An Al target 61 is fixed to the first cathode 6. When the first cathode 6 is
inserted into the vacuum chamber 1, it is positioned with the Al target facing the circumferential
surface of the cooling roll 5. The second cathode 7 of the sputter deposition apparatus is also
inserted into and accommodated in the vacuum chamber 1 and is drawn out of the vacuum
chamber 1. Reference numeral 72 denotes a Ni target attached and fixed to the second cathode
7. When the second cathode 7 is inserted into the vacuum chamber 1, the Ni target 71 is
opposed to the circumferential surface of the cooling roll 5 at the downstream of the ultrathin
film 2 supplied from the first cathode 6. It is positioned. The target 71 of the second cathode 7
can use titanium instead of nickel.
[0013]
41 is a first poly cold installed near the ultrathin film supply path, and 42 is a second poly cold
installed below the cooling roll 5. The first poly cold 41 and the second poly cold 42 are both
heating devices such as heaters for dehumidifying the inside of the vacuum chamber, and are
provided in the vacuum chamber 1 itself. Next, the method of film-forming of the electrode thin
film with respect to the ultra-thin film 2 implemented in the vacuum chamber 1 of a sputter
deposition apparatus is demonstrated. By the way, prior to inserting and storing the film supply
and removal apparatus 100 in the vacuum chamber 1, the ultrathin film 2 is wound around the
supply roll 21 to form a coiled film, and the coiled film is pulled out to sequentially Via the first
supply pulley 22, the second supply pulley 23, the third supply pulley 24, the cooling roll 5, the
first winding pulley 25, the second winding pulley 26, and the third winding pulley 27 Set on the
take-up roll 28. As the ultrathin film 2, an ultrathin film of polyphenyl sulfide or polyethylene
terephthalate having a thickness of about 2 μm is used. The ultra-thin film 2 is cut to a width of
500 mm and a length of about 1000 mm and wound on a supply roll 21. After the ultra-thin film
2 is wound and set on the supply roll 21, the carriage 101 is caused to travel relative to the
vacuum chamber 1 to insert and store the film supply and removal apparatus 100 having the
ultra-thin film 2 set therein. . Then, the Al target 61 is attached and fixed to the first cathode 6
and the Ni target 71 is attached and fixed to the second cathode 7, and the first cathode 6 and
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the second cathode 7 are described above in the vacuum chamber 1 Position in position.
[0014]
Here, after evacuating the vacuum chamber 1 with a vacuum pump, introduce argon Ar and
other sputtering gases of about 101 to 10-1 Pa, and as a target negative potential between the Al
target and Ni target and the cooling roll that is a substrate holder. When DC power is applied,
glow discharge occurs between the two to generate Ar plasma. The Ar positive ion Ar + in this
plasma is accelerated at the cathode potential drop near the target, collides with the target
surface, and is sputtered. The particles of the target constituent material sputtered from the Al
target 61 and the Ni target 71 adhere to the target facing region of the surface of the ultrathin
film 2 supplied to the circumferential surface of the cooling roll 5, and a thin film of the target
constituent material is formed here It will be done.
[0015]
The ultra-thin film 2 wound on the supply roll 21 continues from the supply roll 21 to the takeup roll 28 and finally comes to be taken off by the take-up roll 28. The ultra-thin film 2 is wound
from the supply roll 21 to the separation roll 28 while the supply speed is adjusted by the pinch
roll 241, but the first supply pulley 22, the second supply pulley 23, The film is supplied via the
third supply pulley 24 to the peripheral surface of the cooling roll 5 positioned in the film
deposition section. This ultra-thin film 2 is further removed from the peripheral surface of the
cooling roll 5 to the removal roll 28 via the first removal pulley 25, the second removal pulley
26, and the third removal pulley 27. .
[0016]
As described above, the ultra-thin film 2 is continuously wound from the supply roll 21 to the
take-up roll 28 while being controlled and adjusted by the pinch roll 241 while being wound
around the supply roll 21. An aluminum thin film is deposited on the surface of the first cathode
6 facing the Al target 61 while being deposited. The surface area of the ultrathin film 2 on which
the aluminum thin film is deposited is gradually transferred to the sputtering area of the Ni
target 71 of the second cathode 7 while being removed, and a nickel thin film is deposited on the
surface of the aluminum thin film. The entire surface of the aluminum thin film is covered with a
nickel thin film. Table 1 Sputtering Thickness (Å) Target Size DC Power Supply Rate (W) (M /
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6
min) Aluminum 500 6 ′ ′ 1000 0.48 Nickel 500 6 ′ ′ 500 0.38 Nickel 300 6 ′ ′ 500
0.45 Aluminum + 500 + Nickel The relationship between the feed rate of the ultra-thin film 2 and
the film thickness of the thin film to be formed, which is controlled and adjusted by the 200 6 ′
′ + 3 ′ ′ 800 (Al) 0.40 pinch roll 241, is shown in Table 1 above.
[0017]
As described above, according to the present invention, the thickness of the aluminum thin film
can be 100 Å or more to ensure sufficient electrical continuity. Peeling of the aluminum thin film
can be sufficiently protected by depositing an aluminum thin film on the ultrathin film 2 and
further depositing a nickel thin film or a titanium thin film on the surface of the aluminum thin
film.
[0018]
Then, when depositing an aluminum thin film and a nickel thin film by sputtering in the vacuum
chamber 1, the speed at which the ultrathin film 2 is removed is adjusted to control and adjust
the thickness of the aluminum thin film and the thickness of the nickel or titanium thin film. By
forming a protective coating on the surface of an aluminum thin film with a nickel or titanium
thin film, an electrode thin film that is light in weight, mechanically strong, and has good weather
resistance can be made at once at a very thin film surface made of synthetic resin. The film can
be formed inexpensively.
[0019]
In addition, since the ultrathin film 2 on which the electrode thin film formed of the aluminum
thin film covered and protected by the nickel thin film or titanium thin film formed by the above
steps has a uniform film thickness, It becomes suitable as a vibrating membrane of a converter.
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