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JPS58159095

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DESCRIPTION JPS58159095
[0001]
The present invention relates to a method of manufacturing a speaker diaphragm comprising a
sandwich structure in which a skin material is joined to the surface of a core material, and the
purpose thereof is to use a film of boron or beryllium as a skin material as a core material It is an
object of the present invention to provide a method of manufacturing a speaker diaphragm that
can be joined to the above. In general, the speaker diaphragm may have sufficient linearity to
follow the driving force given by the electromagnetic conversion system within its operating
frequency band, and the entire surface may vibrate in the same phase (piston vibration). It is
considered an ideal. Also, from the viewpoint of sound wave radiation characteristics, a so-called
flat diaphragm having a flat radiation surface is ideal. This flat diaphragm has the disadvantage
that the weight of the divided diaphragm increases and the efficiency of the speaker decreases.
As a method to remedy this defect, a diaphragm using a sandwich structure in which a skin
material is adhered to the surface of a core material consisting of a hollow core has been put to
practical use, but even if such a sandwich structure is used, it is sufficiently lightweight The
conversion was difficult. In addition, when the weight of the sandwich structure is reduced by
thinning the material of the sandwich structure, the strength of the diaphragm is reduced to
cause partial resonance (surface noise phenomenon) to deteriorate the acoustic characteristics.
In order to improve this, a material having a low density and a high modulus of elasticity has
been desired. Boron and beryllium are materials that satisfy this requirement, but all of these
materials have poor processability, and it is impossible to form a foil by rolling of 10 to 20 ?m
like aluminum or titanium. Therefore, attempts have been made to use boron and beryllium as
foils by vapor deposition techniques such as PVD and CVD, but vibration for speakers using
conventional IJ IJium, boron and their composite materials has been made. The boards were all
limited to domes and cones. This is because, in films produced by the PVD method, internal
stress remains in the produced film due to various factors such as lattice defects, surface tension,
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phase transition, etc. In the dome-shaped and cone-shaped diaphragms, because the rigidity due
to the shape is sufficiently large compared to the internal stress of the vapor phase growth film
due to the occurrence, the distortion of the shape is a serious problem. I will. However, in the
planar shape, shape distortion due to internal stress has been an important drawback. In
particular, due to the high brittleness of boron and IJ IJum, it is impossible to mechanically
stretch the resulting film which has undergone warpage or distortion to a flat surface, and
improvement is carried out to reduce the residual stress of the resulting film by heat treatment
after formation. Sufficient effects were not obtained using the method.
The present invention overcomes the disadvantages of the conventional method, provides a flat
skin material of a material having a low density and a high modulus of elasticity, and aims to
realize a high performance flat diaphragm. The manufacturing method of the skin material used
as the main point of the present invention is explained. In the conventional PVD method,
regardless of the presence or absence of ionized particles, the internal stress remains in the film
generated as described above, causing warpage or distortion in the generated film. In particular,
in the vapor phase growth method with ion particles, the generation of stress is remarkable due
to the impact embedding of ions. In order to reduce such internal stress, a method of performing
vapor phase growth while heating the substrate is used, but many (restrictions are imposed to
obtain a flat produced film free of warpage and distortion. For example, in the case of forming a
boron film, according to the inventors' experience, a film having a fairly flat surface property can
be obtained when the substrate is formed while heating to 600 'C or more, but the substrate is
not less than 600' C or more in vacuum. In addition to heat distortion, the substrate is deformed
by heat, and degassing is severe due to temperature rise from the heating part, the substrate, and
the wall of the apparatus, and the gas pressure and atmosphere conditions during generation are
limited. It causes a decrease in film quality. In addition, when using a substrate drive mechanism
such as a planetary, problems occur in the design of the device, such as the heat resistance of the
rotation mechanism and the capacity of the heating device (such as infrared heating), and stable
operation is difficult. On the other hand, since the production method according to the present
invention does not require the substrate heating apparatus as described above, the production
apparatus can be simplified, stable operation can be obtained, and low cost and excellent mass
productivity Have the advantage of being able to Further, the mechanism by which the residual
stress of the formed film is controlled by the present invention is considered to be due to the
following effects. One of them (the depth to which the ions are embedded in the formed film due
to the change of kinetic energy of the ions incident into the formed film, the damage given to the
formed film changes with the film thickness, and the distribution is directional as the whole
formed film Indicates Also, most of the energy of ion bombardment disappears as heat, so
considering the surface of the formed film microscopically, the portion bombarded with ion
bombardment will be subjected to thermal bombardment with a very high energy density, so that
a thin film Equivalent to annealing simultaneously during the formation of And, by changing the
amount of ions and kinetic energy, the annealing conditions are considered to change, and the
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2
amount and directionality of residual stress are considered to change. When controlling the
warpage of the formed film according to the present invention, the amount of energy of the ions
is a problem, and the control effect generally changes depending on the mass of the ions, the
energy upon incidence to the substrate, the amount of ions, etc. The effective condition range is
limited depending on the type of ionization, generation conditions, generated material, substrate
material, shape and the like.
Hereinafter, the method for manufacturing the speaker diaphragm of the present invention will
be described in detail based on examples. As shown in FIG. 1, an aluminum ribbon 11 is knitted
to form a core 12 made of a chrysanthemum-shaped hollow core, and a pure boron skin 13 with
a thickness of 20 ?m on both sides of the core 120 is heated to 2oO to 23o0c.
Thermocompression bonding was carried out with an adhesive under the conditions of a
pressure of 1 to 2 K9 / cd to prepare a flat diaphragm having a diameter of 28 cylinders and a
thickness of about 1 mM. Here, the boron skin material 13i was prepared by evaporating boron
in an atmosphere of 1 to 3 * 165'I'ow by an electron beam evaporation method using a DC ion
plating apparatus. In the DC ion plating apparatus, as shown in FIG. 2, the substrate 2 and the
crucible 4 are disposed opposite to each other in the per jar 1 having an exhaust system, and the
thermion accelerating electrode 3 and the electron beam gun 6 are arranged close to the crucible
4. The thermal electron accelerating electrode 6 to the thermal electron accelerating electrode 3
and the ion accelerating power source 7 as a power source of the substrate 2 are provided. Then,
boron was put in the crucible 4 as the evaporation source 8. At this time, +70 V was applied to
the thermion accelerating electrode 3 to accelerate the thermions emitted from the boron
crucible 4 and to collide with the evaporated particles of boron to ionize the boron. Also, during
the formation of the boron film, a voltage of sKV is applied to the substrate 2 for 2 minutes from
the initial stage of formation, and thereafter 10 minutes of 1KV for 10 minutes, and a thickness
of 20 ?m is formed on the substrate 2 Boron film was formed. A 30 to 50 ?m thick titanium
foil is used for the substrate 2 and the surface is covered with a mask material having a hole of
28 mm in diameter (corresponding to the diameter of the diaphragm), A 20 ?m thick boron film
was formed. After the formation of the boron film, the titanium substrate 2 was dissolved and
removed with a hydrofluoric acid solution having a concentration of 0.6 to 1%, and a flat boron
skin material 13 having a diameter of 28 m and a thickness of 20 ?m was produced. In the
speaker diaphragm configured in this way, it is possible to obtain a flat and warp-free boron skin
material 13, so it is possible to use thermocompression bonding with an adhesive to the core
material 13, and its frequency characteristic is Shown in solid line in the figure. In FIG. 3, a, a
sound pressure frequency characteristic of the speaker diaphragm of the present embodiment,
and b show its secondary high frequency characteristics. Comparative Example 1 A pure boron
skin material having a thickness of 20 ?m was thermocompression bonded at a temperature of
200 to 230 ░ G and a pressure of 1 to 2 Ky / ca to both sides of a core consisting of a hollow
core obtained by knitting an aluminum ribbon in a chrysanthemum shape. Twenty-eight flat
diaphragms with a thickness of about 1 were produced. Here, the boron skin material was
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prepared by evaporating boron in an atmosphere of 1 to 3 x 10 Tow using an electron beam (IB)
deposition method using the DC ion plating apparatus shown in FIG.
At this time, +70 V was applied to the thermion accelerating electrode 3 to accelerate the
thermions emitted from the boron crucible 4 and collide with the evaporated particles of boron
to ionize the boron. Further, while the boron film was formed, a voltage of ?0.5 KV was applied
to the substrate 2 and a voltage was applied for 20 minutes to form a boron film having a
thickness of 20 ?m on the substrate 2. A 30 to 50 11 m thick titanium foil is used for the
substrate 2 and the surface is covered with a mask material having a 28-diameter hole
(corresponding to the diameter of the diaphragm), A Holon film having a thickness of 20 ?m
was produced. After formation of the boron film, the titanium substrate 2 was dissolved and
removed with a hydrofluoric acid solution having a concentration of 0.5 to 1% to produce a
boron skin Hk having a diameter of 28 and a thickness of 20 ?m. In such a diaphragm for a
speaker, the boron film as a skin material has a warp due to the residual internal stress, and is
broken and C at the time of thermocompression bonding to the core material with an adhesive.
Comparative Example 2 A 20 ?m thick aluminum skin material was thermocompression bonded
at a temperature of 200 to 23 ░ C. at a pressure of 1 to 2 Kg / cr; t to a diameter of 28 mm on
both sides of a core consisting of a hollow core obtained by knitting an aluminum ribbon in a
chrysanthemum shape. A flat diaphragm having a thickness of about 1 column was produced.
The sound pressure frequency characteristics of this diaphragm are shown by curve C in FIG. The
boron skin material according to Comparative Example 1 is warped due to residual stress, and
cracks occur during thermocompression bonding in the bonding step with the core, making it
impossible to put into practical use as a diaphragm. The boron skin material produced under the
conditions of the example could be used as a flat diaphragm without cracking even in the
bonding step. Further, in the comparison of the sound pressure-frequency characteristics of the
flat plate diaphragm consisting of this example and comparative example 2 shown in FIG. 4, the
skin material using the aluminum foil of comparative example 2 is replaced with pure holon of
the same thickness. As a result, the primary resonance frequency increased from 12.1 KH2 to
19.3 KH2 and the efficiency was improved by about 1.6 to 2 dB. In the above description,
although boron is described, even if it is IJ IJum, the same function and effect can be obtained,
and the laminate can be used as a skin material without separating the substrate. It goes without
saying. As described above in detail, according to the manufacturing method of the present
invention, it becomes possible to manufacture a flat skin material made of boron or beryllium,
and as a result, high-performance, high-performance vibration for a speaker having high band
characteristics. A board can be realized. In addition, since the substrate heating and heat
treatment after formation are not required, the equipment cost and the manufacturing cost can
be reduced, and the degree of freedom of the boron and beryllium plating conditions can be
greatly increased. It has an advantage that can be selected.
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[0002]
Brief description of the drawings
[0003]
FIG. 1 is a process explanatory view of a method of manufacturing a speaker diaphragm
according to the present invention, FIG. 1 is a schematic diagram showing a DC ion plating
apparatus for obtaining a skin material of the diaphragm, and FIG. It is a comparison figure of the
sound pressure frequency characteristic of a diaphragm and the conventional diaphragm.
1 ...... Peruja, 2 ...... substrate, 3-old и Thermal electron accelerator, 4 ...... Boronrutsubo, 6 .....
electron beam gun, 6 ... иии Thermal electron acceleration power supply, иии и и и Ion acceleration
power supply (substrate voltage power supply), 12 и и и и и и и и и и и и и и и и и и и skin material. Name of
agent Attorney Nakao Toshio has 1 person Fig. 1 Fig. 2 # y yarn Fig. 3 Ifl; skin 1 toe (kHz)
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